Colloidal Silica suspension has a slow crystallization formula, which helps reduce crystallization while keeping silica suspended. It is best for achieving ultra-fine polishing as it has a high chemo-mechanical polishing action. It ensures that the sample surface remains scratch-free down to 0.05 microns. This suspension is recommended for the final polishing of ceramics, minerals, composites, and nonferrous materials.
**Additional fees are incurred for Temperature-controlled products.
